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High-AR TGV Cu Metallization

Metalizing the
glass era.

Cu paste filling technology engineered for high aspect ratio TGV — integrating material, filling, densification and sintering into one process platform.

NEXT-GENERATION
GLASS CORE PACKAGING
SCROLL
01

Why now

As packages get larger and denser,
metallization gets harder.

High-AR TGV pushes conventional plating toward more difficult seed formation, longer filling time, higher void risk and growing equipment burden. TERAMICX is built around a different approach: filling the via volume directly with engineered Cu paste.

02

Technology platform

Four disciplines.
One process window.

Copper particle packing and densification concept
01

Cu Paste

Multimodal Cu particle design for dense packing, conductivity and controlled sintering behavior.

02

Paste Filling

Vacuum and differential pressure to suppress trapped air and fill deep vias uniformly.

03

Densification

Post-filling particle rearrangement to improve green density and minimize void and shrinkage.

04

Sintering

Low-temperature thermal profiles optimized for Cu necking, conductivity and glass interface stability.

Engineered copper paste

Integrated full stack

Not just a paste.
A process architecture.

TERAMICX links formulation, filling conditions, densification and sintering as a single engineering system — designed to move from lab validation to customer-specific qualification.

FormulationVacuum + PressureVoid ControlLow-Temp Sintering
03

Validated performance

Measured.
Not imagined.

2.07 μΩ·cm

Measured resistivity

Best measured value from Cu paste sintered sample.

100 cycles

TCT, no crack

Verified at -55°C to +125°C and -55°C to +150°C conditions.

11:1 AR

Internal structure verified

SEM validation demonstrated dense filling and stable Glass–Cu interface.

70%+ potential

CAPEX reduction

Internal scenario versus seed / plating line at scaled production capacity.

Current development direction

Moving from validated process performance toward repeatability, extended reliability and customer qualification.

Copper filled TGV structure in glass substrate

Strategic position

Designed for the zone where plating becomes increasingly difficult.

As via depth and aspect ratio rise, process burden can grow non-linearly across time, yield and equipment. TERAMICX targets the high-AR region where direct volumetric filling can become structurally attractive.

AR 5
AR 8
AR 12
AR 15+
TERAMICX STRATEGIC ZONE →
04

Application focus

Where glass enables
the next package.

01

AI / HPC Glass Core

Large, dense package architectures with demanding dimensional stability.

02

Large FC-BGA

Advanced core structures requiring scalable vertical interconnect metallization.

03

Chiplet Integration

Interconnect-intensive packaging platforms built around precision and density.

04

CPO / Optical Packaging

Emerging high-density packaging environments requiring compact electrical interconnects.

Connect

Let’s build the
glass interconnect layer.

For technical evaluation, joint development, qualification or pilot discussions, contact TERAMICX.

admin@teramicx.com

TERAMICX

136, Jiksan-ro, Jiksan-eup,
Seobuk-gu, Cheonan-si,
Chungcheongnam-do,
Republic of Korea
(ZIP: 31035)
admin@teramicx.com